Dr. S. Noyel Victoria
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Present Address AL-12, NITK Campus Srinivas Nagar Surathkal |
Permanent Address 31/2, Good Shed Road Tiruverumbur Trichy-13
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Phone: 0091 824 2474000 Ext: 3608 |
E-mail: snoelvictoria@gmail.com |
Objectives: A position in a reputed research organisation, where I can apply my knowledge of electrochemistry and chemical mechanical polishing, as well as learn.
Research Experience:
Post Doc position ( Hanyang University, Ansan Campus, South Korea) (August 2011-Oct 2011), Worked on ceria particle synthesis for semiconductor applications and Ru CMP.
PhD (Indian Institute of Technology Madras, Chennai, India.) (Jan-2007-July 2011)
Thesis Title: Electrochemical Characterization of Copper, tantalum and Ruthenium under Chemical Mechanical Polishing (CMP) conditions
Details:
· Characterized Cu first step polish in acidic slurries using both in-situ and ex-situ techniques and proposed a mechanism of action for L-glutamic acid acting as complexing agent as well as inhibitorusing EIS studies.
· Characterized Ta CMP in Guanidine hydrochloride based slurries and showed that dissolution is negligible while surface modification is likely reason for enhanced removal rateusing potentiodynamic polarization studies
· Characterized the ability of KBrO3to enhance Ru removal rate.
· Characterized metal dissolution using electrochemical impedance spectroscopy
· Developed a novel method to analyze EIS of nonlinear and unstable systems.
· Electrochemical Techniques used: OCP (Open Circuit Potential) Measurements, Linear Polarization Test (Tafel Plots), Impedance .
Skills:
·Chemical Mechanical Polishing for metal and dielectrics
·EIS (Experiments, Equivalent circuit modeling, Reaction mechanism analysis, data fitting)
· Other electrochemical techniques (Potentiodynamic polarization, Tafel extrapolation, open circuit potential)
· Numerical simulation of EIS of nonlinear and unstable systems.
Computer skills: Matlab, C++, Well versed in Windows XP and MS Office
Equipments & Instruments Handled:
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Chemical Mechanical Polishing (CMP) Equipment (Struers) |
Electrochemical Instruments(Parstat 2263, CH instruments CH604c,Princeton applied research potentiostat 273A,SolatronSI1250, RDE |
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Oxide/nitride film Thickness Measurement (Filmetrics F-20 UV, Ellipsometer), KMac Nano Spec |
Particle Size Analyzer ( Brookhaven 90 Plus), Photal ELSZ zeta potential analyzer, PSS-NI Comp Accu Sizer 780 A |
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CMT-SR 5000 Four point probe analyzer for sheet resistance |
UV Vis spectrophotometer |
Key Courses:
1.Introduction to Microelectronic fabrication,
2.Particle Characterization
Education Summary:
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SL. NO. |
Degree |
Name of the Institution |
Graduation |
Grade |
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1 |
Ph.D. (Chem. Engg.) |
Indian Institute of Technology-Madras, India |
July 2011 |
9.4/10 |
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2 |
M.Tech. (Chem. Engg.) |
Siddhaganga Institute of Technology, Tumkur, Karnataka, India |
Sep-2003 |
79.6/100 |
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3 |
B.Tech.(Chem. Engg.) |
AdhiyamaanCollege of Engineering, Hosur, Tamil Nadu, India |
Sep-2001 |
81 /100
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Internship:
Research trainee, Dept. of Chem. and Biomolecular Engg, Clarkson University, NY, From 15 Oct 2010 to 29 Nov 2010.
The Work conducted were
- Ru dissolution and film formation studies using impedance spectroscopy.
- Spectroscopic ellipsometry for study of oxide formation on Ru surface.
- Electrodeposition for thin film solar cells
Work Experience:
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S.No |
Organization |
Position |
Duration |
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1 |
NIT-K, Surathkal |
Assistant Professor |
Nov 2012 to present |
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2 |
SRM University, Chennai |
Assistant Professor |
June -2012 to Nov 2012 |
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3 |
Hanyang University, S. Korea |
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Aug 2011- Oct 2011 |
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4 |
IIT- Madras |
Project associate |
March 2011 to July 2011 |
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5 |
ACE, Hosur |
Lecturer |
Jan 2006- Dec 2006 |
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6 |
Mepco , Sivakasi |
Lecturer |
July 2004 to Jan 2006 |
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7 |
MWSC, Maldives |
SO, WQA |
Oct 2003- July 2004 |
Journal Publications:
1.Electrochemical characterization of copper chemical mechanical polishing in glutamic acid-hydrogen peroxide based slurries, S. Noyel Victoria and S. Ramanathan. J Solid State Electrochem 40 767-776 2010.
2. Potassium bromate as an oxidizing agent in a titania based Ru CMP slurry, S. Noyel Victoria, Pranav P. Sharma, Ian Ivar Suni, and S. Ramanathan, Electrochem. Solid-State Lett,13 H385-H387 2010.
3. Effect of potential drifts on the electrochemical impedance spectra, S.Noyel Victoria and S.Ramanathan, Electrochimica acta, 56 2606-2615 2011.
4.Mechanism of high selectivity in ceria based shallow trench isolation chemical mechanical polishing slurries, R. Manivannan, S. Noyel Victoria and S. Ramanathan, Thin Solid Films 518 5737-5740 2010.
5. Oxone as oxidizing agent for Ru CMP, S Noyel Victoria, J Josiah, I I Suni and S Ramanathan, Electrochemical Solid State Letters 15 H55-H58 2012.
6. Psidium Guajava Leaf Extract as Green Corrosion Inhibitor for Mild steel in Phosphoric Acid,S. Noyel Victoria, Rohith Prasad, , R. Manivannan, Int. J. Electrochem. Sci., 10 (2015) 2220 - 2238, Impact factor 1.9.
Conferences:
1. Synthesis and characterization of nickel nanoparticles, S. Noyel Victoria and S.Ramanathan, Proceedings of the National Conference on Frontiers in Chemical Engineering (NCFCE-2007),IIT Guwahati, India, 12-14 December,2007.
2. Analysis of copper dissolution in glutamic acid and hydrogen peroxide using EIS, S. Ramanathan and S. Noyel Victoria, 218 ECS meeting, Las Vegas, Oct 2010.
3. Studies on chemical mechanical planarization of Ta for semiconductor processing, S.Ramanathan and S. Noyel Victoria , AIChE Annual Meeting, Salt Lake City, Nov 2010 .
Funded Projects:
1. Electrochemical deposition of CZTS for solar cell applications- DST-SERI
2. One step sonochemical synthesis of CZTS for bifacial solar cell applications- DST-SERB (Recommended for funding)